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Supply wafer cleaning machine,suzhou hua lin kena semiconductor equipment technology co., ltd. in Āgra



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Wafer cleaning Products: 1) mainly used in integrated circuit manufacturing process, Photo, DIFF, WET / Etch, Eglass, Nickel and other processes of 2 to 12-inch Wafer processing; 2) the main process: customized according to customer demand, the use of HF/HNO3/HCL / H3PO4/H2SO4 / SC1/SC2/H2SO4/NMP/BOE other liquid, combined with ultrasound, throwing, loop filter, heating, mechanical transmission, automatic with fluid, fluid replacement and other functions, the effective removal of silicon metal ions, particles, dirt, such as plastic, so as to achieve the desired effect; 3) Control mode: manual, semi-automatic; 4) Material: according to customer requirements and technology selection, optional PP, PVC, PVDF, PTFE, quartz, SUS, and other materials;
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Āgra
20-06-2011
0086-512-50175920
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Supply Wafer cleaning machine,Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.

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