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Supply etching cleaning machine,suzhou hua lin kena semiconductor equipment technology co., ltd. in Āgra



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Product information: 1) is mainly used for semiconductor wafer cleaning corrosion; 2) standard Etching process (using HF/HNO3, KOH, NaOH, H3PO4, BOE, DHF, SPM, SOM, etc.); 3) Control mode: manual , semi-automatic, automatic; 4) Material: according to customer requirements and technology selection, optional PP, PVC, PVDF, quartz, stainless steel and other materials;Advantages and Features: Modular design; based on your process and needs, to provide you with a special design; customized according to customer's budget; the best cleaning Treatment Process; cost-effective; many modules for the election; user-friendly interface; safety and environmental protection; easy to maintain; non-standard products, welcome your specific needs based on detailed consultation!
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Āgra
20-06-2011
0086-512-50175920
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Supply Etching cleaning machine,Suzhou Hua Lin Kena Semiconductor Equipment Technology Co., Ltd.

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